I have been having success lately with ashing in a vacuum furnace at 680 C for 30 min followed by ultrasonic cleaning for 90 min. in a mild acid or caustic solution. There are other methods for removal at: http://aveclafaux.freeservers.com/SU-8.html Good luck, Eddie Blackwell Graduate Research Assistant Multiscale Fabrication Industrial & Manufacturing Engineering Oregon State University 503-806-1817 ----- Original Message ----- From: "Tingrui Pan" <> To: "General MEMS discussion" <> Sent: Sunday, July 04, 2004 11:23 AM Subject: [mems-talk] SU-8 Removal > Dear Colleagues, > > Does anyone have any experience on removing SU-8 layer after > photolithography (with or without hard bake)? I need to use SU-8 as a mold > to do electroplating and SU-8 should be removed eventually. Thank you very > much for any of your suggestion, > > ----------------------------------------------- > Tingrui Pan > Ph.D. Candidate > Electrical Engineering > University of Minnesota > Phone: 612-626-7188 (Lab) > 612-624-5034 (Office) > Website: www.ece.umn.edu/groups/umbmlab > ----------------------------------------------- > > > _______________________________________________ > MEMS-talk@memsnet.org mailing list: to unsubscribe or change your list > options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk > Hosted by the MEMS Exchange, providers of MEMS processing services. > Visit us at http://www.memsnet.org/ >