Hi all, I am currently using AZ5214e photo resist (as negative resist, 3um thick) to protect structures from HF vapor. Unfortunately the HF diffuses trough the resist film and etches the "protected" SiO2. Does anyone have experience with (or know) a negative photo resist wich can be used to protect SiO2 against HF vapor? Thanks, Carsten ******* Carsten Dehoff Institut für Werkstoffer der Elektrotechnik, RWTH Aachen Sommerfeldstrasse 24 52074 Aachen Germany