durusmail: mems-talk: optimal Al deposition rate on photoresist
How to clean holes of PI and Mylar films?
2004-11-25
optimal Al deposition rate on photoresist
2004-11-26
2004-11-26
2004-11-29
2004-11-29
optimal Al deposition rate on photoresist
Isaac Wing Tak Chan
2004-11-26
Andrew,

Higher dep rate usually means more voids in a PVD film. Why would you need
high dep rate if your target thickness is only 150A?


Isaac

On Fri, 26 Nov 2004, Andrew Xiang wrote:

> Is there an optimal aluminum evaporation deposition rate on top of
> photoresist? Target thickness is 150A.
> Does faster deposition rate mean better film structure? more resistant to
> corrosion?
>
> thanks
> Andrew
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