durusmail: mems-talk: Help: RIE with small feature size
Help: RIE with small feature size
Help: RIE with small feature size
William Lanford-Crick
2005-01-25
Hi,
I don't have any experience with Silicon etching, but a SiO2
mask will be etched quite fast by an SF6-based plasma....A
photoresist mask might work well (in Bosch process) or you
could try a lift-off metal mask such as NiCr.

Good luck

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