durusmail: mems-talk: Re: Cl2 dry etch, black Si surface
Re: Cl2 dry etch, black Si surface
2005-02-24
Re: Cl2 dry etch, black Si surface
Matteo Dainese
2005-02-24
Hello!
the mask is thick (3µm) thermal SiO2, which we
pre-etch in another reactor.

Matteo

>I had the same problem when etching GaAs and found out that it was related
>to the mask I was using. What kind of etching mask do you use?
>
>Yves



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