durusmail: mems-talk: 3-inch wafer litho uniformity
3-inch wafer litho uniformity
2005-03-14
3-inch wafer litho uniformity
Jobert van Eisden
2005-03-14
For the thinner (<2 um) resists I find it better to use a high acceleration
( 10kRPM/s) or so, going right to the final speed. Thicker resists
find have better uniformity at low acceleration (spread).

Regards,

Jobert van Eisden
SUNY Albany

reply