Ferro produces doping pastes for photovoltaic applications. These are
relatively easy to use and the only equipment you need is an RTA system.
However, I am not sure if you can use these pastes for more than ~0.5um
of doping depth. You can check with them (http://www.ferro.com).

Good Luck,
BB


 >> ------------------------------------------------------------------------
 >>
 >>
 >> Dear Yu Chen,
 >>
 >>
 >> Hello, there are several ways to dope, ion implant, boron solution or
 >> spin-on boron, planar source, Boron gas in the diffusion tube etc.
 >>
 >> It seems the easiest is for you to use a boron solution that can be
spun
 >> on, brushed on or dip coated. These types of solutions can be obtained
 >> from ;
 >> Filmtronics
 >> Butler, Pa.
 >>
 >> Tel 724 352 3790
 >> Fax 724 352 1772
 >>
 >> They have several solutions that can work fine, let them know the
 >> approximate concentration of dopant needed and the temperature you wish
 >> to diffuse at or use RTP.
 >>
 >> Hope this helps, if you have any questions please ask.
 >> Sincerely, Neal
 >>
 >>
 >>
 >> At 01:45 PM 6/24/2005 -0400, you wrote:
 >>
 >
 >>>> I want to build a simple setup of boron doping system.
 >>>> It is going to be used to dope small silicon wafer(2mm*2mm), 1 micron
 >>>> doping
 >>>> depth is enough.
 >>>> is there any reference I can consult to do this job?
 >>>> any suggestion is welcome
 >>>>
 >>>> best
 >>>>
 >>>> Yu Chen
 >
--

    Behraad Bahreyni
    Microfabrication Research Laboratory, Department of ECE
    The University of Manitoba
    15 Gillson St., Winnipeg, MB, Canada   R3T 5V6

    Email: Behraad@ieee.org     Fax:   +1-(204)-261 4639