Dear discussion group,
I got a "problem"- in the process I use for masking and dryetching my
photoresist (Az 5214) gets so "hardened that I can remove it with
conventional means such as aceton, developer or KOH. The problem is that
for achieving good metal mask quality, the photoresist on top has to be
hardbaked and stays 2 days in a vacuum chamber (this process was
developped for an other application but works fine there as they dont
have to get rid of the resist completely). After the structuring of the
metal mask I would like to remove the resist - but I fail- the best
method right now is to put it into aceton for hours and then do sth like
a mechanical lift off by rubbing the surface (but this also damages my
surface). So if you got any recipe  for removing such "resistant"
resist- or ideas what to do: any help is very much appreciated!!!
Yours Regina

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Dipl.-Ing. Regina Grote                  e-mail:grote@physik.uni-kl.de,

AG Integrierte Optoelektronik            tel:   +49-(0)631-205-4149
Universitaet Kaiserslautern              fax:   +49-(0)631-205-4147

Erwin-Schroedinger-Str 46, 67653 Kaiserslautern, Germany