Dear all,

I have SU-8 structures which I need to cover with a photoresist layer in
order to protect them during the dicing process. The solvent to remove
the protection layer should not alter the SU-8 (e.g. SU-8 will swell in
acetone).
Do you have any experience, which photoresist/developer pair is best
suited for this task?
Thanks!

Regards,
Silvan