Hi, there:

I would like to know a general process for T-shape gate process on GaAs or
InP wafer by electron beam lithography.

I also want to know after the e-beam writing, how to take a crosssection
picture by SEM.

I tried several times, and I even coated the wafer by sputtered gold, but
the image quality is not great, when zoom in, the channel on resist got
kind of "melt". and it is very difficult to get a clean cross-section
because the GaAs wafer is too brittle. I search for several articles which
include nice SEM pictures both on resist and the real T-gate after
lift-off. I am really wondering, how could they do it?

Thanks!
David.