Hello All,

I am trying to deposit(spin) polyimide PI 2610 on the
substrate that has features ranging from 1 to 5um in
depth. I am spinning PI2610 for the planar deposition
on the top of the etched features. I need 1um thick
ployimide.

After spinning the PI at 4000 r.p.m. for 30 seconds, i
can see the PI deposition as a conformal deposition
rather than the planar deposition. I can see that the
etched pits were covered only by 1um Polyimide. I want
the features to be filled up completely. I dont want
any crests or troughs on the sample when i scan the
profilometer over the features.

In short, can someone suggest me the procedure to get
the planar deposition of the PI2610 on the substrate
that has different depth features.

Thanks,
Kris