You can try SF6 and CHF3 mixture etching of SiO2, say a gas ratio of 50 sccm
CHF3
and 5 sccm SF6.


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>From: "Xiaojing Zou" 
>Reply-To: General MEMS discussion 
>To: "General MEMS discussion" 
>Subject: [mems-talk] How to remove the PMMA etching residue.
>Date:Tue, 15 Aug 2006 17:35:39 -0400
>
>Hi:
>
>     I did some CF4 and CHF3 etching SiO2 using PMMA as mask. But I found that
there is alway something left around the etched SiO2.  Does anybody have these
kinda experience about removal of these stuff ?? (It cannot be removed by
acetone)
>