In our current project, we need to deposit a multilayer dielectric coatings consisting of alternativing a-Si:H and a-SiNx:H layers. Generally, we deposit them at 250℃ and 350℃ respectively with Oxford Plasma System 100,but now we need to deposit a-SiNx:H with the same deposited temperature of a-Si:H (250℃). So I really need some electronic documents about optical and mechanical propertis of of a-SiNx:H vs deposited conditions at 250℃. The stress of SiNx film should be small and tensile. If possible, could any of you give me some advices, or provide me deposited conditions to achieve this structure?Such as: Gas flow,Temperature,Pressure,HF/LF and so on. Thank you very much! Best wishes Yours sincerely Xu Yan ------------------------------------------------------------------ SIMIT 865 Changning Road,Shanghai PR China 200050 Tel: +86-21-6251-1070 ext.8231 Email: memser@tom.com