Hi,
I intend to use a thin layer of Chrome (10nm) evaporated by e-ebeam on a gold
film and patterned by lift-off process on 300nm gold.  Can this 10nm Chromium
film be used as an etch mask for wet etching the 300nm gold film using aqua
regia (assuming an isotropic undercut of 0.3 microns per side is tolerable)?

Also is 100nm of thermally evaporated gold film on uncrosslinked SU-8 sufficient
to block UV duinr i-line photolthography processing?

Jeffrey