Hi everyone,

I have problem removing photoresist.
I spin coat AZ1518 on silicon, prebaked for 10min @ 90C, after develop, baked
for 20min @ 90C.
Then, I did some RIE with SF6/Ar/O2.  After that, I tried to ash it with O2
plasma for 20min but it didn't come off.  I also tried treat it in Photoresist
remover 1165 heated up to 70C for about 30mins, but nothing happened.  Does
harsher O2 plasma or does heating it up to hundreds of degree in oven help?

Any suggestions?

Thanks
Hao