Dear all, I am looking for helpful info regarding etching glass or quartz substrate with higher etch rate and vertical sidewall. Traditional HF etching gives isotropical etch and STS dry etch with F radical gives slow etch rate, they are all not good for my case since I am etching around 30-50um deep wells inside the substrate. Anyone can share your experience? Or anyone can provide the information of the vendor who can do this job. Appreciate your help . Michael