I've never tried this, but a KOH etch might work. Warm (75C) KOH will
aggressively remove Al. It's a bit of a long shot, but a quick search didn't
reveal anything on ITO etching, so if you mask it properly, it might work. It
will generate a lot of oxygen though, which will probably give you uneven
etching. Playing with the temperature/agitation might help this, if it works at
all.

Kevin Paul Nichols
MESA+ Institute for Nanotechnology
Mesoscale Chemical Systems
Meander 151
University of Twente
Postbus 217
7500 AE Enschede
The Netherlands


-----Original Message-----
From: mems-talk-bounces@memsnet.org on behalf of Mustafa Celik
Sent: Sun 8/5/2007 12:05 AM
To: mems-talk@memsnet.org
Subject: [mems-talk] Aluminum etchand request

Hi all,

I am trying to pattern a thin film of Al which is
coated on top of Indium-Tin-Oxide(ITO)layer. However
widely used MF319 positive PR Developer demages the
ITO. I've also tried lift-off but the result was not
satisfactory. Could you suggest me an alternative Al
etchand which does not attact ITO ?