You use E-beam to evaporate an thin oxide layer.  I doubt about the use of
hydrogen peroxide because it probably won't give you layer thick enough as you
required.

Ning Wu
The Department of Chemical Engineering
Princeton University
New Jersey 08544


----- Original Message -----
>From   "memser" 
Date    Tue, 30 Oct 2007 21:26:57 +0800
To      "mems-talk@memsnet.org" 
Subject         [mems-talk] get a thin oxadation layer

Hello all,
       I'd like to get  a thin oxadation layer (100-500A) on the surface of my
structure, but  thermal oxidation is forbidden for its high temperature (lower
than 300 ¡ãC is OK).  Now, I want to dip the whole wafer into hydrogen peroxide
(H2O2)  or put it into oven (120 ¡ãC) for a while.   Are these method available?
If not, is there any other methods to achieve such a thin oxadation layer
(100-500A).  Does anyone has experience to to this? Thanks a lot.

Best wishes!
X.Yan
memser@tom.com