Hello Michael,

in my experience it is possible to etch Chromium in an O2-Plasma as long
your wafers can stand temperatures > 190°C.
Chromium should build at those temperatures volatile CrO3 and disappear.

Best regards,

Martin Lapisa
Microsystem Technology Laboratory
Royal Institute of Technology (KTH Stockholm)

-----Original Message-----
From: Michael D Martin [mailto:michael.martin@louisville.edu]
Sent: Donnerstag, 29. November 2007 17:09
To: mems-talk@memsnet.org
Subject: Re: [mems-talk] Chrome Plasma Etching without Cl?

If your Cr layer is thin you might be able to just sputter it off, even with
oxygen.

-Michael Martin
  U. of Louisville