Steven,

Acetone won't affect properly cross-linked SU-8. If it's not optimally exposed
and baked, it may induce some minor cracks, but it should still be fine for use
as a microchannel. I have no idea what acetone will do to your particular SAM
though.

- Kevin

*********************************
Kevin Paul Nichols
MESA+ Institute for Nanotechnology
Mesoscale Chemical Systems
Meander 151
University of Twente
Postbus 217
7500 AE Enschede
The Netherlands

Office: +31 (0)53 489 26 31
Mobile: +31 (0)6 49 312 471
Fax   : +31 (0)53 489 35 95
Email : k.p.nichols@utwente.nl



-----Original Message-----
From: mems-talk-bounces@memsnet.org on behalf of Steven Yang
Sent: Sun 12/23/2007 5:14 AM
To: mems-talk
Subject: [mems-talk] SU-8 channel with OTS pattern: will O2 plasma cleanattack
OTS?

Hi, all

I got two question about making a SU-8 microchannel with OTS (a SAM
hydrophobic material) modified pattern on part of channel bottom.

My first plan is to deposit OTS first on Si sub which with a layer of
SiO2. and then SU-8 photoresist pattern on to get the channnel pattern
with that OTS pattern just exposured at channel bottom. For this plan,
I got a question that whether the later O2 plasma to make whole
channel clean and hydrophilic will attack the OTS part to destroy it
or not? if attack, how to protect this part through the O2 plasma?

My second plan is to make the SU-8 channel pattern first, and then O2
plasma clean, After that, AZ5214 photoresist on to pattern OTS. But
for this plan, I am worring about the step that apply acetone to
remove AZ5214 after OTS deposit which also attack SU-8. In this case,
how to perform the AZ5214 removal with some chemical whith will not
attack SU-8.