Hello, My name is Daniel Fine and I am a post doc at the University of Texas at Austin. I am trying to ebeam evaporate Pyrex (7740) and am running into a problem where I am finding it hard to prevent bubbling and thus spitting of the material when I try to achieve deposition rates of 5 Angstrom per second or higher. The films are therefore covered with non-uniform streaks of Pyrex. I am using a CHA evaporator. I have tried a steady beam spot in one place and an oscillating beam spot as well but get the same problem of large bubble formation. I would greatly appreciate any input concerning how I might over come this problem. Thanks, Daniel Fine