Hi I´m using black wax as wet etching protector. In bibliografy it is dissolved in toluene and cured at 100 ºC in oven for 1 hs, then after being deposited on the wafer. The problem is that this protective film only takes about an hours in KOH 40% at 60ºC. Someone has experience what are the optimal conditions for working with this material? Thanks Anahí -- Lic. Anahi F. Weinstock INSTITUTO NACIONAL DE TECNOLOGÍA INDUSTRIAL CENTRO DE INVESTIGACIÓN Y DESARROLLO EN TELECOMUNICACIONES, ELECTRÓNICA E INFORMÁTICA Teléfono (54 11) 4724 6200/6300/6400 Interno 6377 Fax (54 11 ) 4754 5194 wanahi@inti.gov.ar 0800 444 4004 | www.inti.gov.ar