Do you have a desiccator present (bell-jar connected to a roughing vacuum pump)? If not, a "dirty" vacuum processing tool that nobody will mind having wet resist placed in? You might be able to get filling that way after doing your solvent/resist puddle. As a disclaimer, I haven't tried this myself, but I wouldn't think it would affect the resist much more than a poorly optimized soft bake would. - Kevin > From: Robert Black> Reply-To: General MEMS discussion > Date: Tue, 28 Oct 2008 14:47:01 -0500 > To: 'General MEMS discussion' > Subject: Re: [mems-talk] Filling deep vias with resist > > Thanks for the replies. > > I am definitely trapping air in the vias. I have > tried doing a PGMA puddle (resist solvent) to let it fill the via, and > follow with resist and have it wick down the via. X-sections appear to show > that the PGMA didn't reach the bottom of the via. I assume some sort of > de-wetting. I'd love to try spray, but capital expenditures are frozen. > > I'm trying to fill and planerize the top side before backside pattern. > > Robert