Oxygen plasma with or without the addition of a small amount of CF4 or
SF6.  Bill Moffat

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From: mems-talk-bounces@memsnet.org on behalf of Javier Crespo
Sent: Mon 11/17/2008 7:42 AM
To: mems-talk@memsnet.org
Subject: [mems-talk] selective negative resist stripper

Dear All,

Could anyone tell me how could I remove negative photoresist from a
silicon wafer without affecting metal layer (Ni or AlSi)?

I know that the piranha etching etches the resist in a higher rate than
the metal, but I don't know in which percentage.