Hi Andrea,

Try AZ9260, it performs better than AZ4562 and 4620 for a layer
thicker than 10um. I got thickness from 5um to 30um. But the
uniformity is not perfect when you are dealing with a very thick
layer. And the pattern would be slightly larger than your mask since
you have to over expose your wafer.

Good luck.
Fei

2008/12/20, Andrea Mazzolari :
> Hello all,
> i need to spin and pattern a 10um thick S1813 photoresist. I've searched
> for optimal parameters in the S1813 datasheet but could not find anything
> which could help in this direction.
> Is there someone who already have done this ?
>
> If it is not possible to achieve such thick S1813 layer, are there other
> photoresists which can provide this thickness and that are compatible with
> a bosch process ?
>
> Best regards,
> Andrea

Fei Wang
Postdoctoral researcher, Dr
MIC - Department of Micro and Nanotechnology
Technical University of Denmark (DTU)
Building 344, 1st floor, Room no. 130
DK-2800, Kgs. Lyngby
Denmark
Tel:  +45 4525 6311
Fax:  +45 4588 7762
Email: fei.wang@nanotech.dtu.dk
       http://www.nanotech.dtu.dk