Hi,

I am depositing LPCVD polysilicon film (in NON-MOS furnace) on my SOI sample
which has a layer of titanium and platinum exposed. After deposition I can see
the metal surface becomes rough and formation of 'black spots' on it. I tried
changing the dep. temperature but still get the same result. Moreover when I
etch the deposited poly layer (RIE) the dots and roughness seems to stay there.

I would appreciate any help in this regard.

Umer