Hy Evelyn, after development i do an hard bake of 5 min at 115 °C over hot plate. If you don't have an hot plate you can use an hoven (140 °C for 40 min). In order to improve etch resistance i also suggest you to use HMDS as adesion promoter. Basing on my experience i can say that it really helps a lot. Best regards, Andrea > I have heard that for improved etch resistance 1813 resist should be > post-develop baked. Does any one know the recommended post development > bake > temperature and duration for 1813 resist? I understand that both the > temperature and duration should be larger than that of the soft-bake.