Hi

I need to deposit SiO2 layers about 10 microns thick for a microwave
device. At the moment, am using spin-on glass (solvent based) as an easy
way of getting done. However, I am not able to achieve good films beyond
4 microns.

Could anybody suggest a better speedier method to deposit SiO2 or a
better spin-on glass material.

Thanx

Senthil Nathan

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