Novellus equipment (Concept1) deposits silicon oxide (silane or TEOS) at the
rate of 1 um/minute.........they cn give you a listing of places where you can
have this deposition done.

Best regards,

A. Ayon







At 03:42 AM 9/28/98 PDT, you wrote:
>
>Hi
>
>I need to deposit SiO2 layers about 10 microns thick for a microwave
>device. At the moment, am using spin-on glass (solvent based) as an easy
>way of getting done. However, I am not able to achieve good films beyond
>4 microns.
>
>Could anybody suggest a better speedier method to deposit SiO2 or a
>better spin-on glass material.
>
>Thanx
>
>Senthil Nathan
>
>______________________________________________________
>Get Your Private, Free Email at http://www.hotmail.com
>
>
Arturo A. Ayon, Ph.D.
Research Scientist

Microsystems Technology Laboratories
Massachusetts Institute of Technology
60 Vassar Street, Room 31-45
Cambridge, MA 02139
Phone......(617) 253-6049
Fax........(617) 258-6093
ayon@mtl.mit.edu

__________________________________________