Dear  Ozgur,

Thanks a lot for your detailed reply.

I will deposit 10 nm TiW / 300 nm Mo.

Your information is really useful.

Thanks,
Pradeep


On Tue, Jun 30, 2009 at 10:18 PM, ozgur celik wrote:

> Hi
>
> I did not do any electroplating but I have done a lot of surface chemistry
> on Mo.
>
> If the MoOx is the problem.
>
> Mo surface always has thin native oxide , as it is in most of the metals.
> But when the surface is passivated with this oxide, further oxidation almost
> stops.
>
> You can etch this oxide in various ways but as soon as you bring the Mo in
> air it will re oxidize, a thin layer like 1-2 nm thick,
>
> Someone did suggest a website:
>
> http://www.ee.byu.edu/cleanroom/wet_etch.phtml
>
> The suggested method in this web site is HCl+H2O2. In this method H2O2
> oxidizes Mo and acid dissolves it, as a result  Mo gets etched. However this
> will never remove the oxide, final surface will allways have oxide due to
> H2O2. Also it is an isotropic and very fast etchant. Depending on how thick
> Mo is but you can loose all Mo in seconds. You can try acid only.
>
> Also You can use dry etching like, fluorine or chlorine chemistry would
> etch it but you need to find a way to transfer it to your electroplating
> apparatus without bringing it to air.
>
> cheers
>
> ozgur