durusmail: mems-talk: overexposed resist removal
overexposed resist removal
overexposed resist removal
Jose.Marques@uv.es
2009-07-28
Dear all,

Does anybody know how to remove overexposed ZEP520 and/or PMMA?
I tried with acetone and pyrrolidinone at 25ÂșC, but it is not enough to
remove them. My structures are made just of silicon and silicon dioxide.

Should I try a oxigen plasma at low power?

Any suggestion would be greatly appreciated!

Regards,

Jose
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