Sure there is a lot one can do with AZ photoresist........if the photo process
was ok and you just need to postbake......then it should not be any
problem.....with oven or without oven....i guess i know little about the process
but most AZ resist are post baked at a temperature not more than 100°C for 1min
on hotplate and abt 10 in oven....if u left it for two weeks that should not be
a problem but u can check the structures under microscope if the photo process
was ok before postbake...if the photo process is not good the postbake will not
be good as well.....
i hope this helps...

Regards,

--- On Tue, 8/11/09, Y.Tian  wrote:

From: Y.Tian 
Subject: [mems-talk]  Post-bake of AZ photoresit
To: "General MEMS discussion" 
Date: Tuesday, August 11, 2009, 2:29 PM

Hi All,

Would anybody comment the post-bake of developed AZ photoresist? I just found
that the structure swells when I tried to post-bake the sample. Because I am
worrying that the AZ will adsorb moisture from the air and the sample was
prepared weeks ago, I just tried to dry it. Through the thickness direction, it
looks the sidewall is curved when the heat travel through it, which was
straight.

Anybody has experience about this?

Thanks a lot!

Regards,
Yingtao