still LPCVD will be able to do the trick. you probably can try to an annealing process after the deposition process. that can help. but how thick should the nitride be? it depends what thickness of nitride you are looking for, for your beams. just a little help for you to consider. regards, Nimo --- On Mon, 8/17/09, Roger Shilewrote: From: Roger Shile Subject: [mems-talk] Source for Low Stress Silicon Nitride To: "General MEMS discussion" Date: Monday, August 17, 2009, 9:32 AM Can someone suggest a commercial for low stress silicon nitride with low stress gradient? Low stress gradient is important as the films will be used to fabricate free standing beams which must remain straight when released. Roger Shile