Dear all,

we created patterns on SiO2 with Cr and Au(etching process).  Then, PMMA
was spin coated on the chip followed by EBeam lithography to create a
few windows on PMMA.  We etched part of SiO2 in diluted HF(5:50ml) for
5mins.  After removing PMMA in acetone, we found all fine gold
structures peeled off even under areas protected by PMMA.

Could I have some suggestions to solve it please?

Thanks,
Hao