Hi All,

Has anyone tried to lithographically structure silicone materials such as
WL5150 from Dow Corning?  We did some tests with WL5150 on silicon substrates
which were carefully cleaned in Caro and HF-Dip and afterwards water baked
out in the oven. A standard spin on program was done @ 1200 RPM to reach a
final thickness of around 25 µm following a soft bake @120°C for 2 min.
After broadband exposure in MA6 from SUSS the substrates were baked for 2
min @ 140°C (PEB) on a hotplate.

The resulting substrates were afterwards developed in Siloxane based
developer suggested from DC, and as a result all structures were washed away
from the substrate!

My Question:  Does anyone in this forum have some experience in processing
photopatternable silicones, like Dow Corning Wl5150 or similar materials?
Maybe we did something wrong in the processing? Maybe we have to wear gloves
from nitrile?!?

Any ideas would help. Thanks in advance.

Ciao,
Thomas