I am not aware of the chemical composition of Suralyn but I would be
surprised to find it can not be silanized.  The problems with most
resist adhesion is the belief that the priming solution does all the
work.  It does not.  The vacuum total dehydration before the application
of the primer is the important step. I am on vacation at the moment.
Contact me next week, I will try to contact you but your email is not
the question.  It is possible I can both improve your resist adhesion
and promote silanization on your Suralyn.  If you reply please give
clearer details of your process and chemical details of Suralyn.

Bill Moffat

________________________________

From: mems-talk-bounces@memsnet.org on behalf of Jose Guevarra
Sent: Fri 8/28/2009 7:22 AM
To: General MEMS discussion
Subject: [mems-talk] NIL: NXR-2010 resist gets ripped off



Hi,

  I'm doing a nanoimprint lithography process where I've been using a
soft mold (embossed Surlyn) and NXR-2010 photoresist (25nm) with several
underlayers namely, TI-Prime, NXR-3022, and PMMA.  I crosslink the resist
with UV then try to remove the soft mold; the resist seems to get ripped
off on most occasions. As far as I know, Surlyn can't be silanized which
would prevent the resist from sticking to it.

Can anyone suggest a way of getting better adhesion between the
underlayer and resist? or a treatment for Surlyn.