Dear MEMS community,

I'm planning to work on COC (Cyclic Olefin Copolymer) substrate injected or
extruded from TOPAS grades 6017 and 5013. The polymer is made of norbornene and
ethylene.

These Topas grades should be resistant to classical solvants and alcohols
(acetone, IPA, methanol) and some acids like sulfuric acid 40% and hydrochloric
acid 36%.

Does someone have an idea of the behaviour of this kind of polymer in piranha
solution (H2SO4 96%: H2O2 30%  5:2) or in TMAH based developper (AZ 726 MIF)?

Is it also etched in O2 plasma (100W minimum, > 0.5sccm O2)?

Thank you,


Julie Verstraeten