is hot Phosphoric Acid an option for you?

On Mon, Dec 28, 2009 at 3:27 AM, Aleksandar Tomovic wrote:

> Dear All,
>
> i need to do a wet etch of SiN (don't have equipment for dry etch),i read
> that
> it is  possible to do a wet etch with BHF, while using photoresist as etch
> mask, but i also read somewhere that the photoresist will last only for a
> short period of time (20 min). My SiN layer is 180nm thick. If anyone could
> give me more data on this subject i would appreciate it.
>
> Thanks in advance!
>
> A.Tomovic

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_fmaya