Hello, everybody, I need photoresist which could produce steep sidewall after
developing. And I also need a 5-7 microns film thickness. Does anybody use
Futurrex positive photoresist before? If so, please give me some advices
about this photoresist, especially about the method to obtain the steep
sidewall.

Thank you.

Yours sincerely,

Lei Wang

School of Physics
Shandong University
5, Hongjialou,
Jinan, Shandong Province 250100
P. R. China
Tel:86-531-88364655  Fax: 86-531-88565167
Email: leiwangsdu@sdu.edu.cn