Hi, everyone:

     I have glass samples coated with 50nm Ni (by e-beam evaporation)

     Just wondering if it is possilbe to grow another layer of material on
top of it.  We need the thickness to be around 500-800nm, and it should be
able to be vertically etched (after patterning the resist) to expose the
bottom Ni.

    For Si, SiO2 and SiN,  which has the potential to achieve that?

   Any suggestions? Thanks