Just to add to Al's remarks, to make sure this works repeatably you will want to
use the same size wafer with the same etch pattern on the test wafer and the
"real" wafer to avoid being thrown off by any loading or other effects.

Brad Cantos
brad.cantos@holage.com
http://holage.com




On 2 Sep 2010, at 9:22 AM, Albert Henning wrote:

> Timed etch:  Process a test wafer; measure the depth; re-adjust the time
> for your 'real' wafer.
>
> Al Henning
> NanoInk