Dear guys,

For my RIE processes, I need new substrate holders (6'' inch wafers)
which are quite safe in the chemical attacking environment. I have two
chambers:

1. Mainly Si etching with fluorine gases
2. Mainly III-V etching with chlorine gases

I was thinking of different possibilities:

A. Silicon wafer
B. Aluminium plate galvanically coated with some safe metal (e.g. gold?)

What and which material do you think is best for the two etch processes?
Any help will be highly appreciated.

Furthermore do you have any recipes to etch 20nm of Al2O3 deposited by
ALD? I have a typical parallel plate reactor.

Thanks in advance
Daniel