We use N2 as a carrier gas in PECVD TEOS oxide deposition with no N incorporation. With NH3 in the process the index of refraction remains in the SiO2 range. As for DCS I believe Cl2/HCl in the aluminum chamber could be problematic. Best regards, Glenn -----Original Message----- From: Ruiz, Marcos Daniel (SENCOE) [mailto:Dan.Ruiz@Honeywell.com] Sent: Friday, September 17, 2010 1:35 PM To: General MEMS discussion Subject: Re: [mems-talk] PECVD SiN wiithout Silane? SiH2Cl2 is routinely used in LPCVD; can it also work in PECVD? Also, have you considered a liquid source - like TEOS? I've worked at a company that used TEOS to deposit PECVD oxide. Dan