Friends,

We have ASE DRIE from STS.

I will like to know if  it is O.K  to deposit C4F8 polymer layer on a
metal  piece using DRIE.

As I understand , metal mask/ metal is not allowed in DRIE as metal
gets sputtered away and contaminates the chamber when SF6 starts
etching.

But if one wants only to deposit polymer, is it O.K to use DRIE
chamber with C4F8 plasma?

--
Ashwini