Use vacuum vapor prime for resist adhesion.  Good adhesion for 20 minutes of HF
etching.

Bill Moffat

-----Original Message-----
From: mems-talk-bounces+bmoffat=yieldengineering.com@memsnet.org [mailto:mems-
talk-bounces+bmoffat=yieldengineering.com@memsnet.org] On Behalf Of Grimm, Dr.
Daniel
Sent: Thursday, November 18, 2010 1:34 AM
To: General MEMS discussion
Subject: Re: [mems-talk] AZ5214E and anodic bonding

Hi Yan Xin,

normally I have not very good results using AZ5214 in HF etching processes due
to adhesion problems. After some time (~1/2 min), HF tends to lift the resist
(depending on your surface preparation). Furthermore, AZ5214 is not resistant
against penetration of HF through the resist - you'll get partly exposed
surfaces after a couple of minutes.
We use ARP-3510, or even better, ARP-3100 (both from Allresist) for long HF
etching processes.

I think you burn your resist at 400°C and you might not be able to remove it
afterwards.

Best
Daniel