Hi everyone,

Do you have any experimental experience on dry etching of PMMA?
I try to make dot pattern on PMMA/Si substrate by nanoimprint by using
PDMS mold. The pattern can be easily transferred to PMMA layer/Si
substrate. But I found it is difficult to remove the residual PMMA
layer. I have tried to remove it by O2 plasma (30W, 0.5Torr). The result
was not so good. I failed to etch undesired PMMA layer without damage
the required area.

Do you have any suggestions? Thank you very much!

Meng Gang