Hello,

we are experiencing the following problem.

After a KOH etching of Si the etched surfaces (especially walls) are covered
with small particles (they look like... mmm... bubbles or mushrooms).
Surface roughness is alright. This is only these "bubbles" that bother.
Mask is SiO2. Does anybody have any idea what it could be and how to avoid
them?

Many thanks in advance!

Regards
--
Denis