We have a STS PECVD system and deposit amorphous carbon as an etch mask
using this PECVD system.
CH4(methane) is used as a carbon source.
The carbon layer has compressive stress, but we wish to make carbon thin film
with tensile stress.  But we have no idea.
If possible, low tensile stress (less than 100MPa) is required.
Please let me know the recipe.
Thank you.

Dongwan Kim