Has anyone pursued a method as a replacement for RIE in nano-imprint lithography for the descum step? NIL could be a lot more useful if the descum didn't require expensive equipment too. I am curious if dielectric barrier discharge, or some sort of atmospheric plasma could be used for this step, it would open up a wide variety of options in terms of substrate size, and could reduce the cost of performing that step. I'd be interested in pursuing it, if anyone has any ideas. Sincerely, David Casale