Aarthi,

That sounds like a very thick layer for seed. Have you tried hard
bake/descum in RIE O2 plasma before wet etch?

Regards,
Glenn

-----Original Message-----
From: Aarthi Lavanya Dhanapaul [mailto:cqtald@nus.edu.sg]
Sent: Monday, April 04, 2011 8:31 PM
To: mems-talk@memsnet.org
Subject: [mems-talk] Silicon etch


I have been trying to remove a 1 micron thick Chromium seed layer using
commercially available chrome etchant. But I find the etching is not
uniform, even though there is agitation as well as heating been done. And my
structures on top of chromium ends up being messy.

Can any one suggest a better alternative or suggestions.

Thanks
Aarthi